|
| SIGMA-C公司 (德) |
| SIGMA-C公司是国际先进的光刻模拟软件企业 |
| Product |
| - simulation
of μ-lithography: |
SOLID-CTM |
| - simulation
of e-beam lithography: |
SELIDTM |
| resist
characterization: |
FIRM |
| process
window analysis: |
PWATM |
| layout
data preparation: |
CAPROXTM |
|
|
SOCID-C |
| SOLID-C: optical μ-lithography
simulation |
 |
the
SOLID-C TM suite of simulators covers the widest
range of technology in μ-Lithography |
| -simulation
of optical μ-lithography: |
SOLID-C |
| -rigorous
mask simulator: |
SOLID-CM |
| -rigorous
wafer simulator: |
SOLID-CT |
| -all-in-one:
|
SOLID-CTM |
| -rigorous
EUVL simulator: |
SOLID-EUV |
| all
packages are available on PCs and Unix workstations
The customer gets advanced solutions from one source |
|
| SOLID-CM:
topographic masks |
| core
value |
 |
copes
with any 3D feature of a topographic mask |
| fully
fledged simulator including resist imaging |
| fast
and accurate (ref: Sematech benchmark) |
| -
differentiation |
|
|
versatile editor for 3D topography |
| -
outstanding features |
| accurate,
resilient Maxwell solver |
| fast
finite difference time domain (FDTD) algorithm |
| easy
support for multi exposure |
| - the
Maxwell solver is a development with Fraunhofer |
| SOLID-CM
is the fastest simulator for PS-masks (ref: Sematech) |
|
| SOLID-CT:
topographic wafers |
| -core
value |
 |
copes
with 2.5D features on a topographic wafer |
 |
| fully
fledged simulator including resist imaging |
| the
only solution for topographic wafers |
| - differentiation |
| versatile
editor for 3D topography |
| - outstanding
features |
| accurate,
resilient Maxwell solver |
| easy
support for multi exposure |
| full
3D support available in 2003 |
| -
the Maxwell solver is a development with Fraunhofer |
topography
on the wafer is again on the agenda.
SOLID-CT is the only solution |
|
| SOLID-CTM:
all in one |
 |
- core
value |
 |
| combines
strengths of both SOLID-CM and SOLID-CT |
| fully
fledged simulator including resist imaging |
| -differentiation |
| the
only fully integrated solution |
| -
outstanding features |
| application
of strong phase-shift masks over topographic wafers |
| easy
support for multi exposure |
| -
the Maxwell solver is a development with Fraunhofer |
| SOLID-CTM
is a one-of-a-kind software |
|
| |
| 中国代理EMD
联系方法 |
| 上
海 |
|
EMD
地址： 上海市普陀区宁夏路201号绿地科创大厦21楼B座
邮编：200063
电话：(021)61021225、61021226
传真：(021)52353710
中电网设备材料部 EMD@ECCN.com
|
陈建彰 Benjamin Chan
Business Development Director
Tel:021 - 61021225 X 808
Email:benchan@ECCN.com |
黄晨 Chen Huang
Product Manager
Tel：021 - 61021225 x 821
Email:huangchen@ECCN.com
|
王冬梅 Meta Wang
Product Manager
Tel:021 - 61021225 x 820
Email:wangdongmei@ECCN.com |
凌强 Leo Ling
Product Manager
Tel:021 - 61021225 x 826
Email:lingqiang@ECCN.com |
| 苏 州 |
杨军 Yang
Jun
Product Manager
手机:13913185114
email:yangjun@ECCN.com
|
| 深
圳 |
|
EMD
地址:深圳市福田区振华路72号电子器材大厦407室
邮编:518031
电话:0755-81549596 83342710 (直线) 0755-83243191(总机)
传真:0755-83243291
中电网设备材料部 EMD@ECCN.com
|
梁倩 Alice Liang
Product Manager
手机: 13162392386
email: aliceliang@ECCN.com
|
|
|
